Ultrathin stable transparent conductive nickel films were deposited on quartz substrates by radio frequency sputtering at room temperature. Such films showed visible transmittance up to 80% and conductivity up to 1.8 × 104 S/cm, further increased to 2,3 × 105 S/cm by incorporation of a micrometric silver grid. Atomic force microscopy and scanning electron microscopy revealed quite compact, smooth and low surface roughness films. Excellent film stability, ease, fast and low cost process fabrication make these films highly competitive compared to indium tin oxide alternative transparent conductors. Films were characterized regarding their morphological, optical and electrical properties. © 2015 Elsevier B.V.

Ultrathin and stable Nickel films as transparent conductive electrodes

Pilloni, L.;Rinaldi, A.;Bossi, S.;Di Sarcina, I.;Grilli, M.L.;Piegari, A.
2015

Abstract

Ultrathin stable transparent conductive nickel films were deposited on quartz substrates by radio frequency sputtering at room temperature. Such films showed visible transmittance up to 80% and conductivity up to 1.8 × 104 S/cm, further increased to 2,3 × 105 S/cm by incorporation of a micrometric silver grid. Atomic force microscopy and scanning electron microscopy revealed quite compact, smooth and low surface roughness films. Excellent film stability, ease, fast and low cost process fabrication make these films highly competitive compared to indium tin oxide alternative transparent conductors. Films were characterized regarding their morphological, optical and electrical properties. © 2015 Elsevier B.V.
Ultra-thin films;Indium-free electrodes;Nickel;Metal films;Transparent electrodes
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12079/3995
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
social impact