The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.

Miniaturized optical devices produced by electron beam lithography in lithium fluoride films

Montereali, R.M.
2000

Abstract

The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.12079/4261
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