The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.
Miniaturized optical devices produced by electron beam lithography in lithium fluoride films
Montereali, R.M.
2000
Abstract
The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.File in questo prodotto:
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