R.F. sputtered ultrathin silver-silica heterostructures were studied by variable-angle spectroscopic ellipsometry and by its analogue working in total reflection mode. The last one enables an enhanced sensitivity to the interface plasmonic properties. © OSA 2013.

Ellipsometric modeling of ultrathin silver-silica heterostructures

Sytchkova, A.;Grilli, M.L.;Zola, D.
2013

Abstract

R.F. sputtered ultrathin silver-silica heterostructures were studied by variable-angle spectroscopic ellipsometry and by its analogue working in total reflection mode. The last one enables an enhanced sensitivity to the interface plasmonic properties. © OSA 2013.
9781557529701
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12079/4521
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