Optical materials and coatings are exposed to the flux of energetic particles when used in either space applications or nuclear energy plants. The study of their behavior in such an environment is important to avoid failure of the optical components during their operation. The optical performance of several thinfilm materials (HfO2, Ta2O5, Nb2O5, TiO2, SiO2) and coatings, under irradiation with high-dose gamma rays (5.8 MGy) and exposure to low-energy (60 keV) protons, has been investigated. Some variations of optical properties have been detected in silicon oxide after irradiation, while the other materials are stable in such conditions.

Behavior of optical thin-film materials and coatings under proton and gamma irradiation

Zola, D.;Sytchkova, A.;Scaglione, S.;Piegari, A.;Menchini, F.;Grilli, M.L.
2014

Abstract

Optical materials and coatings are exposed to the flux of energetic particles when used in either space applications or nuclear energy plants. The study of their behavior in such an environment is important to avoid failure of the optical components during their operation. The optical performance of several thinfilm materials (HfO2, Ta2O5, Nb2O5, TiO2, SiO2) and coatings, under irradiation with high-dose gamma rays (5.8 MGy) and exposure to low-energy (60 keV) protons, has been investigated. Some variations of optical properties have been detected in silicon oxide after irradiation, while the other materials are stable in such conditions.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.12079/3374
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