The morphology and local mechanical properties of gold nitride thin films were studied by atomic force microscope (AFM). Gold nitride films were deposited for the first time on silicon substrate without any buffer layer at room temperature by reactive laser ablation. The films were fabricated on (100) Si wafers by pulsed KrF excimer laser ablation of a gold target in N2 ambient atmosphere (0.1-100 Pa). Scanning electron microscopy (SEM) and AFM inspections showed that the films were smooth flat plane with rms roughness in the range of 35.1-3.6 ran, depending on the deposition pressure. Rutherford backscattering spectrometry (RBS) and energy dispersion spectroscopy (EDS) used to detect the nitrogen concentration in the films, have revealed a composition close to AU3N. The film's Hardness, Young's modulus, and scratch resistance were evaluated by nanoindentation and nanoscratch techniques in which AFM equipped with a diamond tip mounted on a metal foil cantilever was used. Indentation and scratch measurements yielded hardness values of 2-3 GPa and a Young's modulus value close to 100 GPa.

Nano indentation inspection of the mechanical properties of gold nitride thin films

Valerini D.
2006-01-01

Abstract

The morphology and local mechanical properties of gold nitride thin films were studied by atomic force microscope (AFM). Gold nitride films were deposited for the first time on silicon substrate without any buffer layer at room temperature by reactive laser ablation. The films were fabricated on (100) Si wafers by pulsed KrF excimer laser ablation of a gold target in N2 ambient atmosphere (0.1-100 Pa). Scanning electron microscopy (SEM) and AFM inspections showed that the films were smooth flat plane with rms roughness in the range of 35.1-3.6 ran, depending on the deposition pressure. Rutherford backscattering spectrometry (RBS) and energy dispersion spectroscopy (EDS) used to detect the nitrogen concentration in the films, have revealed a composition close to AU3N. The film's Hardness, Young's modulus, and scratch resistance were evaluated by nanoindentation and nanoscratch techniques in which AFM equipped with a diamond tip mounted on a metal foil cantilever was used. Indentation and scratch measurements yielded hardness values of 2-3 GPa and a Young's modulus value close to 100 GPa.
2006
Atom force microscopy
Nanoindentation
Nanoscratching
Thin film
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12079/75447
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