In recent years, the morphology control of semiconductor nanomaterials has been attracting increasing attention toward maximizing their functional properties and reaching their end use in real-world devices. However, the development of easy and cost-effective methods for preparing large-scale patterned semiconductor structures on flexible temperature-sensitive substrates remains ever in demand. In this study, vapor post-treatment (VPT) is investigated as a potential, simple and low-cost post-preparative method to morphologically modify gravure-printed zinc oxide (ZnO) nanoparticulate thin films at low temperatures. Exposing nanoparticles (NPs) to acidic vapor solution, spontaneous restructuring pathways are observed as a consequence of NPs tending to reduce their high interfacial energy. Depending on the imposed environmental conditions during the treatment (e.g., temperature, vapor composition), various ZnO thin-film morphologies are produced, from dense to porous ones, as a result of the activation and interplay of different spontaneous interface elimination mechanisms, including dissolution–precipitation, grain boundary migration and grain rotation–coalescence. The influence of VPT on structural/optical properties has been examined via XRD, UV–visible and photoluminescence measurements. Controlling NP junctions and network nanoporosity, VPT appears as promising cost-effective, low-temperature and pressureless post-preparative platform for preparing supported ZnO NP-based films with improved connectivity and mechanical stability, favoring their practical use and integration in flexible devices.

Studies on Morphological Evolution of Gravure-Printed ZnO Thin Films Induced by Low-Temperature Vapor Post-Treatment

Sico G.;Borriello C.;Montanino M.
2024-01-01

Abstract

In recent years, the morphology control of semiconductor nanomaterials has been attracting increasing attention toward maximizing their functional properties and reaching their end use in real-world devices. However, the development of easy and cost-effective methods for preparing large-scale patterned semiconductor structures on flexible temperature-sensitive substrates remains ever in demand. In this study, vapor post-treatment (VPT) is investigated as a potential, simple and low-cost post-preparative method to morphologically modify gravure-printed zinc oxide (ZnO) nanoparticulate thin films at low temperatures. Exposing nanoparticles (NPs) to acidic vapor solution, spontaneous restructuring pathways are observed as a consequence of NPs tending to reduce their high interfacial energy. Depending on the imposed environmental conditions during the treatment (e.g., temperature, vapor composition), various ZnO thin-film morphologies are produced, from dense to porous ones, as a result of the activation and interplay of different spontaneous interface elimination mechanisms, including dissolution–precipitation, grain boundary migration and grain rotation–coalescence. The influence of VPT on structural/optical properties has been examined via XRD, UV–visible and photoluminescence measurements. Controlling NP junctions and network nanoporosity, VPT appears as promising cost-effective, low-temperature and pressureless post-preparative platform for preparing supported ZnO NP-based films with improved connectivity and mechanical stability, favoring their practical use and integration in flexible devices.
2024
acetic acid
chemical sintering
grain rotation
gravure printing
nanojunctions
nanoparticles coalescence
nanostructured networks
porous film
pressureless
zinc oxide
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.12079/79147
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